Professor Bram Hoex of the School of Photovoltaic and Renewable Energy Engineering (SPREE) at the University of New South Wales (UNSW) in Sydney, Australia, recently acquired a Meaglow Ltd. UHV series hollow cathode plasma source. The unit replaces an inductively coupled plasma source on their commercial plasma assisted ALD system and will aid in the reduction of oxygen contamination in non-oxide films. Professor Hoex is shown in the picture, his group is active in research looking at novel nanoscale thin films for use with solar cell and hydrogen (catalysts for water splitting and fuel cells) technology with a strong emphasis on advanced material metrology for the study of material growth and properties.