The University of Connecticut group of Prof. Necmi Biyikli and collaborators have published a recent paper on the ALD growth of vanadium oxide. Comparison is made between the use of an ICP (inductively coupled plasma) and one of Meaglow’s new large area hollow cathode plasma sources mounted on an #U ALD system. Both sources were able to grown crystalline V2O5, while post-growth treatments accessed other polymorths. The Journal of Vacuum Science and Technology A paper can be accessed at this link.