Another customer who wants to reduce oxygen contamination in their nitride and/or non-oxide films! This Meaglow UHV series hollow cathode plasma source will go to a European customer for the conversion of a well known brand of plasma assisted atomic layer deposition (ALD), but it’s currently an ALD system with a sapphire lining for its inductively coupled plasma (ICP) source. Sapphire is known to have less of an oxygen contamination problem from etching of the plasma liner than sources with quartz liners, however, as it explained in a recent article published in the journal “Coatings,” it is the second best option.
Meaglow’s hollow cathode plasma sources 
are the industries best solution to the oxygen contamination problem from old last century, legacy plasma sources, so why settle for second best when you can use tried and true 21st century technology?
Check out our complete product line at www.meaglow.com. Or email us at info@meaglow.com.