Meaglow Research Reactor | Meaglow Hollow Cathode Plasma Sources

Meaglow builds custom made research scale plasma assisted ALD/pulsed CVD equipment to our customers spec.

Meaglow’s hollow cathode plasma source (featuring low oxygen contamination, high radical production and low plasma damage).
4” or 8” substrates , other sizes possible.
Patented high temperature pulse processes.
Superior nitride deposition.
No short circuiting of plasma source.
Carbon reduction techniques.
Plasma and thermal ALD during the same run.
UHV compatibility.
Computer control.
Temperatures and processes to 650 degrees C.
Optional process pressure control.
Optional etch facility incorporation.